Sample preparation by focused ion beam without argon ion milling for quantitative electron holography of p-n junctions
Author:
Affiliation:
1. Center for Complex Analysis, GLOBALFOUNDRIES, Malta, New York 12020, USA
2. Advanced Technology Development, GLOBALFOUNDRIES, Malta, New York 12020, USA
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.5086797
Reference26 articles.
1. Two-Dimensional Mapping of the Electrostatic Potential in Transistors by Electron Holography
2. Mapping of Electrostatic Potential in Deep Submicron CMOS Devices by Electron Holography
3. Quantitative Electron Holography of Biased Semiconductor Devices
4. In situ electron holographic analysis of biased Si n+-p junctions
5. Application of electron holography to analysis of submicron structures
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