Triode plasma etching
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.90746
Reference5 articles.
1. Ion‐surface interactions in plasma etching
2. Scanning Electron Induced Desorption Study of Surface Fluorine Migration
3. RF Sputter-Etching by Fluoro-Chloro-Hydrocarbon Gases
4. Plasma etching of Si and SiO2—The effect of oxygen additions to CF4 plasmas
5. Reactive ion etching of aluminum and aluminum alloys in an rf plasma containing halogen species
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