Ion‐surface interactions in plasma etching
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.324150
Reference16 articles.
1. Plasma etching in integrated circuit manufacture—A review
2. Control of relative etch rates of SiO2 and Si in plasma etching
3. Introduction to ion and plasma etching
4. Dry process technology (reactive ion etching)
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