Optimizing laser produced plasmas for efficient extreme ultraviolet and soft X-ray light sources
Author:
Publisher
AIP Publishing
Subject
Condensed Matter Physics
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4891970
Reference24 articles.
1. Laser-produced plasma-based extreme-ultraviolet light source technology for high-volume manufacturing extreme-ultraviolet lithography
2. Laser produced plasma sources for nanolithography—Recent integrated simulation and benchmarking
3. LPP-EUV light source development for high volume manufacturing lithography
4. Pure-tin microdroplets irradiated with double laser pulses for efficient and minimum-mass extreme-ultraviolet light source production
5. Enhancing the performance of LPP sources for EUV and BEUV lithography
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4. Measurements of x-ray spectra and absolute energies of laser produced Al plasmas;Sixth International Symposium on Laser Interaction with Matter;2022-12-22
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