Sub-50 nm metrology on extreme ultra violet chemically amplified resist—A systematic assessment
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Published:2015-10
Issue:10
Volume:86
Page:103702
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ISSN:0034-6748
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Container-title:Review of Scientific Instruments
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language:en
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Short-container-title:Review of Scientific Instruments
Author:
Maas D. J.ORCID,
Fliervoet T.,
Herfst R.,
van Veldhoven E.,
Meessen J.,
Vaenkatesan V.,
Sadeghian H.
Cited by
4 articles.
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