1. A holistic metrology approach: hybrid metrology utilizing scatterometry, CD-AFM, and CD-SEM
2. The International Technology Roadmap for Semiconductors (San Jose: Semiconductor Industry Association, 2012), http://member.itrs.nethttp://member.itrs.net.,
3. Gaps Analysis for CD Metrology Beyond the 22 nm Node;Bunday,2013
4. Inline e-beam metrology: The end of an era for image-based critical dimensional metrology? New life for defect metrology (Invited Paper);Solecky,2013
5. Review of current progress in nanometrology with the helium ion microscope