Uncertainty evaluation of Monte Carlo simulated line scan profiles of a critical dimension scanning electron microscope (CD-SEM)

Abstract

In recent years, precision and accuracy for a more precise critical dimension (CD) control have been required in CD measurement technology. CD distortion between the measurement by a critical dimension scanning electron microscope (CD-SEM) and a reference tool is the most important factor for a more accurate CD measurement. CD bias varies by a CD-SEM and a pattern condition. Therefore, it is urgently needed to identify, characterize, and quantify those parameters that may or may not affect the CD measurement by a CD-SEM. The sensitivity of the Monte Carlo simulated CD-SEM images with multiple physical modeling components has been studied previously. In this study, we demonstrate that the work function and elastic scattering potential models have a significant impact on secondary electron emission intensity, but their influence on the shape of the linescan profile is small, and other factors like the optical energy loss function and dielectric function models have even smaller effects. We have evaluated the uncertainty in the linescan profiles of Si line structures with different sidewall angles due to several different physical factors. It is found that when the CD is evaluated by a peak/valley method, the uncertainty of the CD is negligible. Therefore, it is concluded that the CD value and its related uncertainty are not critically related to the physical factors of the present Monte Carlo simulation model but rely dominantly on the line structure and electron beam parameters.