Effect of cluster/particle deposition on atmospheric pressure chemical vapor deposition of SiO2 from four gaseous organic Si-containing precursors and ozone-Reference-Cited by-同舟云学术

Effect of cluster/particle deposition on atmospheric pressure chemical vapor deposition of SiO2 from four gaseous organic Si-containing precursors and ozone

Published:1999-04-15 Issue:8 Volume:85 Page:4196-4206
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Fujimoto Toshiyuki,Okuyama Kikuo,Yamada Satoshi,Adachi Motoaki

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.370331

Reference28 articles.

1. Evaluation of fine particle formation by CVD in laminar-flow aerosol reactor.

2. Aerosol formation by rapid nucleation during the preparation of SiO2 thin films from SiCl4 and O2 gases by CVD process

3. Gas-Phase Nucleation in GaAs Thin Film Preparation by Metal Organic Chemical Vapor Deposition

4. Particle Size Distribution in a Low Pressure SiH4 : O 2 : He Chemical Vapor Deposition Reactor: Experimental and Numerical Results

5. Model of particle-vapor codeposition with application to ceramic materials synthesis

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