Large temperature range model for the atmospheric pressure chemical vapor deposition of silicon dioxide films on thermosensitive substrates-Reference-Cited by-同舟云学术

Large temperature range model for the atmospheric pressure chemical vapor deposition of silicon dioxide films on thermosensitive substrates

Published:2020-09 Issue: Volume:161 Page:146-158
ISSN:0263-8762
Container-title:Chemical Engineering Research and Design
language:en
Short-container-title:Chemical Engineering Research and Design

Author:

Topka Konstantina Christina^ORCID,Chliavoras George Alexander,Senocq François,Vergnes Hugues,Samelor Diane,Sadowski Daniel,Vahlas Constantin,Caussat Brigitte

Funder

Agence Nationale de la Recherche

Publisher

Elsevier BV

Subject

General Chemical Engineering,General Chemistry

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5. Obtention of ZrO2–SiO2 hydrogen permselective membrane by chemical vapor deposition method;Choi;Chem. Eng. J.,2013

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