Author:
Okuyama Kikuo,Huang David,Seinfeld John H.,Tani Naoyuki,Kousaka Yasuo
Subject
Applied Mathematics,Industrial and Manufacturing Engineering,General Chemical Engineering,General Chemistry
Reference22 articles.
1. The chemistry and transport phenomena of chemical vapor deposition of silicon from SiCl4 gas;Ban;J. Crystal Growth,1975
2. Gas-phase decomposition of silane in a horizontal epitaxial reactor;Eversteijin;Philips Res. Repts,1971
3. Thermal diffusion in metal organic chemical vapor deposition;Holstein;J. Electrochem. Soc.,1988
4. On the relation between binary diffusivity and mean free path;Huang;J. Colloid Interface Sci.,1988
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22 articles.
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