Modeling and analysis of SiO2 deposition during high-purity fused silica glass synthesis by SiCl4 chemical vapor deposition
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Process Chemistry and Technology,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference19 articles.
1. Modeling and optimization of porous silica ingot melting during quartz glass synthesis;Ma;Appl. Therm. Eng.,2018
2. Study of SiCl4/H2/O2 chemical kinetics and its application to fused silica glass synthesis;Huang;Combust. Sci. Technol.,2018
3. Effects of precursors on silica particle generation in CVD synthesis for fused silica glass;Huang;J. Non-Cryst. Solids,2018
4. Silica glasses and optical fibers prepared by plasma chemical vapor deposition using bromide precursors;Nikolin;Inorg. Mater.,2003
5. Comparison of high-purity H2/O2 and LPG/O2 flame-fused silica glasses from sol-gel silica powder;Torikai;J. Non-Cryst. Solids,1994
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