Effects of a chirped bias voltage on ion energy distributions in inductively coupled plasma reactors-Reference-Cited by-同舟云学术

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Effects of a chirped bias voltage on ion energy distributions in inductively coupled plasma reactors

Published:2017-08-28 Issue:8 Volume:122 Page:083301
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Lanham Steven J.¹^ORCID,Kushner Mark J.²

Affiliation:

1. Department of Chemical Engineering, University of Michigan, 1301 Beal Ave., Ann Arbor, Michigan 48109-2122, USA

2. Department of Electrical Engineering and Computer Science, University of Michigan, 1301 Beal Ave., Ann Arbor, Michigan 48109-2122, USA

Funder

Department of Energy

National Science Foundation

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/am-pdf/10.1063/1.4993785

Reference31 articles.

1. Review of inductively coupled plasmas for plasma processing

2. Modeling and simulation of plasma etching reactors for microelectronics

3. Plasma etching: Yesterday, today, and tomorrow

4. Control of ion energy distributions using a pulsed plasma with synchronous bias on a boundary electrode

5. Control of ion energy distribution at substrates during plasma processing

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1. Numerical characterization of capacitively coupled plasma driven by tailored frequency modulated radio frequency source;Plasma Sources Science and Technology;2024-05-01

2. Electron-assisted PR etching in oxygen inductively coupled plasma via a low-energy electron beam;Physics of Plasmas;2023-02-01

3. Comment on ‘Coincident ion acceleration and electron extraction for space propulsion using the self-bias formed on a set of RF biased grids bounding a plasma source’;Journal of Physics D: Applied Physics;2021-05-18

4. Numerical investigation of low pressure inductively coupled plasma sources: A review;Acta Physica Sinica;2021

5. Progress in nanoscale dry processes for fabrication of high-aspect-ratio features: How can we control critical dimension uniformity at the bottom?;Japanese Journal of Applied Physics;2018-05-25

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