Modeling and simulation of plasma etching reactors for microelectronics-Reference-Cited by-同舟云学术

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Modeling and simulation of plasma etching reactors for microelectronics

Published:2000-04 Issue:2 Volume:365 Page:348-367
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Economou Demetre J

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference141 articles.

1. Handbook of Plasma Processing Technology,1990

2. Principles of Plasma Discharges and Materials Processing;Leiberman,1994

3. Nonthermal Plasma Techniques for Pollution Control, Parts A and B,1992

4. Film Deposition by Plasma Techniques;Konuma,1992

5. Plasma Polymerization;Yasuda,1985

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