On how to measure the probabilities of target atom ionization and target ion back-attraction in high-power impulse magnetron sputtering-Reference-Cited by-同舟云学术

On how to measure the probabilities of target atom ionization and target ion back-attraction in high-power impulse magnetron sputtering

Published:2021-01-21 Issue:3 Volume:129 Page:033303
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Rudolph Martin¹^ORCID,Hajihoseini Hamidreza²^ORCID,Raadu Michael A.³,Gudmundsson Jon Tomas²³^ORCID,Brenning Nils³⁴⁵,Minea Tiberiu M.⁵^ORCID,Anders André¹⁶^ORCID,Lundin Daniel⁴⁵^ORCID

Affiliation:

1. Leibniz Institute of Surface Engineering (IOM), Permoserstraße 15, 04318 Leipzig, Germany

2. Science Institute, University of Iceland, Dunhaga 3, IS-107 Reykjavik, Iceland

3. Department of Space and Plasma Physics, School of Electrical Engineering and Computer Science, KTH Royal Institute of Technology, SE-100 44 Stockholm, Sweden

4. Plasma and Coatings Physics Division, IFM-Materials Physics, Linköping University, SE-581 83 Linköping, Sweden

5. Laboratoire de Physique des Gaz et des Plasmas—LPGP, UMR 8578 CNRS, Université Paris–Sud, Université Paris–Saclay, 91405 Orsay Cedex, France

6. Felix Bloch Institute of Solid State Physics, Leipzig University, Linnéstraße 5, 04103 Leipzig, Germany

Funder

Swedish Research Council

Swedish Government Strategic Research Area in Material Science on Functional Materials at Linkoping University

European Regional Development Fund

Icelandic Research Fund

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/5.0036902

Reference34 articles.

1. Ionized physical vapor deposition (IPVD): A review of technology and applications

2. Physics and technology of magnetron sputtering discharges

3. Hardware and power management for high power impulse magnetron sputtering

4. Influence of ionization degree on film properties when using high power impulse magnetron sputtering

5. Paradigm shift in thin-film growth by magnetron sputtering: From gas-ion to metal-ion irradiation of the growing film

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