Influence of ionization degree on film properties when using high power impulse magnetron sputtering-Reference-Cited by-同舟云学术

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Influence of ionization degree on film properties when using high power impulse magnetron sputtering

Published:2012-05 Issue:3 Volume:30 Page:031507
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Samuelsson Mattias,Lundin Daniel,Sarakinos Kostas,Björefors Fredrik,Wälivaara Bengt,Ljungcrantz Henrik,Helmersson U.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.3700227

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