Paradigm shift in thin-film growth by magnetron sputtering: From gas-ion to metal-ion irradiation of the growing film-Reference-Cited by-同舟云学术

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Paradigm shift in thin-film growth by magnetron sputtering: From gas-ion to metal-ion irradiation of the growing film

Published:2019-12 Issue:6 Volume:37 Page:060801
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Greczynski Grzegorz¹^ORCID,Petrov Ivan¹²,Greene J. E.¹²³⁴,Hultman Lars¹

Affiliation:

1. Thin Film Physics Division, Department of Physics (IFM), Linköping University, SE-581 83 Linköping, Sweden

2. Materials Science Department and Frederick Seitz Materials Research Laboratory, University of Illinois, Urbana, Illinois 61801

3. Department of Physics, University of Illinois, Urbana, Illinois 61801

4. Department of Materials Science and Engineering, National Taiwan University of Science and Technology, Taipei 10607, Taiwan

Funder

Åforsk

VINNOVA

Knut och Alice Wallenbergs Stiftelse

Carl Tryggers Stiftelse för Vetenskaplig Forskning

Vetenskapsrådet

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5121226

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