On direct-current magnetron sputtering at industrial conditions with high ionization fraction of sputtered species-Reference-Cited by-同舟云学术

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On direct-current magnetron sputtering at industrial conditions with high ionization fraction of sputtered species

Published:2024-07 Issue: Volume:487 Page:131028
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Hnilica Jaroslav^ORCID,Klein Peter^ORCID,Učík Martin^ORCID,Debnárová Stanislava^ORCID,Klusoň Jan^ORCID,Vašina Petr^ORCID

Funder

Ministry of Education Youth and Sports of the Czech Republic

Publisher

Elsevier BV

Reference49 articles.

1. The influence of ion bombardment on the adhesion of thin films to substrates;Pawel;Nucl. Instrum. Methods Phys. Res. B,1990

2. Microstructural evolution during film growth;Petrov;J. Vac. Sci. Technol. A: Vac., Surf., Films,2003

3. Strain-free, single-phase metastable Ti0.38Al0.62N alloys with high hardness: metal-ion energy vs. momentum effects during film growth by hybrid high-power pulsed/dc magnetron cosputtering;Greczynski;Thin Solid Films,2014

4. On the control of deposition process for enhanced mechanical properties of nc-TiC/aC: H coatings with DC magnetron sputtering at low or high ion flux;Souček;Surf. Coat. Technol.,2014

5. Metal-ion subplantation: A game changer for controlling nanostructure and phase formation during film growth by physical vapor deposition;Greczynski;J. Appl. Phys.,2020

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