Be‐ion implantation in AlxGa1−xAs
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.337063
Reference18 articles.
1. Implantation into an AlGaAs/GaAs Heterostructure
2. Mg+ and Be+ ion implantation into AlxGa1−xAs
3. Application of thermal pulse annealing to ion-implanted GaAlAs/GaAs heterojunction bipolar transistors
4. Radiative Recombinations in be-Doped Alx Ga1-x As
5. p‐njunction formation inn‐AlGaAs by beryllium ion implantation
Cited by 12 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. AlGaAs/GaAs modulation-doped structures grown on a Be-ion-implanted GaAs back gate;Semiconductor Science and Technology;1997-11-01
2. Diffusion of implanted Be in AlxGa1−xAs as a function of Al concentration and anneal temperature;Applied Physics Letters;1995-01-16
3. ION IMPLANTATION IN III–V SEMICONDUCTOR TECHNOLOGY;International Journal of Modern Physics B;1993-12-30
4. Residual defects in AlGaAs co‐implanted with Be and P or As;Journal of Applied Physics;1990-11-15
5. Implant activation and redistribution in AlxGa1−xAs;Journal of Applied Physics;1990-03
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