Time-dependent O2 mass balance change and target surface oxidation during mode transition in Ti–O2 reactive sputtering
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.372128
Reference8 articles.
1. Oxidation of an aluminum magnetron sputtering target in Ar/O2mixtures
2. Surface oxidation kinetics of sputtering targets
3. High‐rate reactive sputter deposition of aluminum oxide
4. An investigation of hysteresis effects as a function of pumping speed, sputtering current, and O2/Ar ratio, in Ti‐O2reactive sputtering processes
5. Investigation of the effects of pumping speed and Ar/O2 ratio on the transient time at mode transition in Ti-O2 reactive sputtering
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3. Metallic-mode reactive sputtering of nickel oxide thin films and characterization of their electrochromic properties;Japanese Journal of Applied Physics;2019-04-16
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