High‐rate reactive sputter deposition of aluminum oxide-Reference-Cited by-同舟云学术

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High‐rate reactive sputter deposition of aluminum oxide

Published:1989-05 Issue:3 Volume:7 Page:1240-1247
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Jones Fletcher,Logan Joseph

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.576262

Cited by 31 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Modeling of Reactive Sputtering—History and Development;Materials;2023-04-20

2. Arrays of electrically-addressable, optically-transmitting 3D nanostructures on free-standing, flexible polymer films;Flexible and Printed Electronics;2018-06

3. Stable reactive deposition of amorphous Al 2 O 3 films with low residual stress and enhanced toughness using pulsed dc magnetron sputtering with very low duty cycle;Vacuum;2016-02

4. The influence of plasma power on the temperature-dependant conductivity and on the wet chemical etch rate of sputter-deposited alumina thin films;Surface and Coatings Technology;2009-06

5. Dielectric integrity of ion beam deposited aluminum oxide films in the 10–100 nm thickness range;Materials Letters;2008-02

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