Stable reactive deposition of amorphous Al 2 O 3 films with low residual stress and enhanced toughness using pulsed dc magnetron sputtering with very low duty cycle-Reference-Cited by-同舟云学术

Stable reactive deposition of amorphous Al 2 O 3 films with low residual stress and enhanced toughness using pulsed dc magnetron sputtering with very low duty cycle

Published:2016-02 Issue: Volume:124 Page:96-100
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Kohout Jiří,Bousser Etienne,Schmitt Thomas,Vernhes Richard,Zabeida Oleg^ORCID,Klemberg-Sapieha Jolanta,Martinu Ludvik

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference31 articles.

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3. Reactive direct current magnetron sputtering of aluminum oxide coatings;Sproul;J. Vac. Sci. Technol. A,1995

4. Using pulsed direct current power for reactive sputtering of Al2O3;Belkind;J. Vac. Sci. Technol. A,1999

5. Thermal stability of alumina thin films containing γ-Al2O3 phase prepared by reactive magnetron sputtering;Musil;Appl. Surf. Sci.,2010

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