Elimination of Arcing in Reactive Sputtering of Al2 O3 Thin Films Prepared by DC Pulse Single Magnetron
Author:
Publisher
Wiley
Subject
Polymers and Plastics,Condensed Matter Physics
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/ppap.201000208/fullpdf
Reference7 articles.
1. Reactive d.c. high-rate sputtering as production technology
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