The influence of plasma power on the temperature-dependant conductivity and on the wet chemical etch rate of sputter-deposited alumina thin films
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
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1. Multilayer PVD coatings for wear protection
2. Electrical behavior of 4H-SiC metal-oxide-semiconductor structures with Al2O3 as gate dielectric
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