An investigation of hysteresis effects as a function of pumping speed, sputtering current, and O2/Ar ratio, in Ti‐O2reactive sputtering processes
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.349791
Reference13 articles.
1. Discharge characteristics for magnetron sputtering of Al in Ar and Ar/O2 mixtures
2. Influence of the nitrogen partial pressure on the properties of d.c.-sputtered titanium and titanium nitride films
3. Effect of N2Ar mixing on the reactive sputtering characteristics of silicon
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