High-rate sputter deposition of chromium oxide thin films using water vapor as a reactive gas-Reference-Cited by-同舟云学术

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High-rate sputter deposition of chromium oxide thin films using water vapor as a reactive gas

Published:2020-04 Issue: Volume:387 Page:125509
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Wang Fan,Abe Yoshio,Kawamura Midori,Kim Kyung Ho,Kiba Takayuki^ORCID

Funder

Japan Society for the Promotion of Science

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference29 articles.

1. Sputter Deposition;Westwood,2003

2. Reactive sputtering of metals in oxidizing atmospheres

3. The deposition rate of metallic thin films in the reactive sputtering process

4. Reactive high rate D.C. sputtering: Deposition rate, stoichiometry and features of TiOx and TiNx films with respect to the target mode

5. TwinMag II: Improving an advanced sputtering tool

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Preparation and characterization of chromium oxide thin films: The response of morphology, crystal structure, and electrical properties to oxygen pressure under magnetron sputtering;Vacuum;2024-10

2. Reactive sputter deposition of β-Ni(OH)₂ thin films in Ar + H₂O mixed gas atmosphere at a substrate temperature of −80 °C;Japanese Journal of Applied Physics;2023-04-01

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