In-situ gallium-doping for forming p+ germanium-tin and application in germanium-tin p-i-n photodetector
Author:
Affiliation:
1. Department of Electrical and Computer Engineering, National University of Singapore, Singapore 117576
2. Department of Physics and Yale-NUS College, National University of Singapore, Singapore 117551
Funder
Singapore National Research Foundation through the Competitive Research Program
the Academic Research Fund
Trailblazer Grant
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4947116
Reference50 articles.
1. Ge0.97Sn0.03 p-channel metal-oxide-semiconductor field-effect transistors: Impact of Si surface passivation layer thickness and post metal annealing
2. Germanium-tin n-channel tunneling field-effect transistor: Device physics and simulation study
3. Germanium–Tin (GeSn) p-Channel MOSFETs Fabricated on (100) and (111) Surface Orientations With Sub-400 $^{\circ}\hbox{C}\ \hbox{Si}_{2}\hbox{H}_{6}$ Passivation
4. Tensile-Strained GeSn Metal–Oxide–Semiconductor Field-Effect Transistor Devices on Si(111) Using Solid Phase Epitaxy
5. Extended performance GeSn/Si(100) p-i-n photodetectors for full spectral range telecommunication applications
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