Oxidation of titanium nitride in room air and in dry O2
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.349194
Reference23 articles.
1. Low temperature oxidation behavior of reactively sputtered TiN by x‐ray photoelectron spectroscopy and contact resistance measurements
2. Oxidation kinetics of TiN thin films
3. Applications of TiN thin films in silicon device technology
4. Advanced metallization of very-large-scale integration devices
5. Investigation of reactively sputtered TiN films for diffusion barriers
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