Oxidation kinetics of TiN thin films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.328659
Reference15 articles.
1. Refractory silicides for integrated circuits
2. Oxidation of sputtered molybdenum silicide thin films
3. Oxidation mechanisms in WSi2thin films
4. Kinetics of the thermal oxidation of WSi2
5. Characterization of Thin Film Molybdenum Silicide Oxide
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