Resistivity scaling and electron surface scattering in epitaxial Co(0001) layers-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Resistivity scaling and electron surface scattering in epitaxial Co(0001) layers

Published:2019-06-28 Issue:24 Volume:125 Page:245105
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Milosevic Erik¹,Kerdsongpanya Sit¹,McGahay Mary E.¹,Zangiabadi Amirali²^ORCID,Barmak Katayun²^ORCID,Gall Daniel¹^ORCID

Affiliation:

1. Department of Materials Science and Engineering, Rensselaer Polytechnic Institute, 110 8th St., Troy, New York 12180, USA

2. Department of Applied Physics and Applied Mathematics, Columbia University, 116th St. and Broadway, New York, New York 10027, USA

Funder

National Science Foundation

Semiconductor Research Corporation

Empire State Development's Division of Science, Technology and Innovation

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/am-pdf/10.1063/1.5086458

Reference74 articles.

1. Alteration of Cu conductivity in the size effect regime

2. Resistivity size effect in epitaxial Ru(0001) layers

3. Electron scattering at surfaces and grain boundaries in Cu thin films and wires

4. Specular electron scattering at single-crystal Cu(001) surfaces

Cited by 39 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. The impact of titanium alloying on altering nanomechanical properties and grain structures of sputter-deposited cobalt for electromigration reliability enhancement;Journal of Alloys and Compounds;2024-10

2. Unconventional magnetoresistance and resistivity scaling in amorphous CoSi thin films;Scientific Reports;2024-09-04

3. Electron scattering at interfaces in epitaxial W(001)–Mo(001) multilayers;Journal of Applied Physics;2024-08-16

4. Vacancy-Type Defects and Oxygen Incorporation in NiAl for Advanced Interconnects Probed by Monoenergetic Positron Beams and Atom Probe Tomography;ACS Applied Electronic Materials;2024-07-10

5. CuTi as Potential Liner- and Barrier-Free Interconnect Conductor;IEEE Transactions on Electron Devices;2024-05

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3