Unconventional magnetoresistance and resistivity scaling in amorphous CoSi thin films-Reference-Cited by-同舟云学术

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Unconventional magnetoresistance and resistivity scaling in amorphous CoSi thin films

Published:2024-09-04 Issue:1 Volume:14 Page:
ISSN:2045-2322
Container-title:Scientific Reports
language:en
Short-container-title:Sci Rep

Author:

Rocchino Lorenzo,Molinari Alan,Kladaric Igor,Balduini Federico,Schmid Heinz,Sousa Marilyne,Bruley John,Bui Holt,Gotsmann Bernd,Zota Cezar B.

Funder

Schweizerischer Nationalfonds zur Förderung der Wissenschaftlichen Forschung

Publisher

Springer Science and Business Media LLC

Link

https://www.nature.com/articles/s41598-024-71614-w.pdf

Reference40 articles.

1. Kundu, S. et al. Exploring topological semi-metals for interconnects. JLPEA 13, 16 (2023).

2. Gall, D. et al. Materials for interconnects. MRS Bull. 46, 959–966 (2021).

3. Zhang, C. et al. Ultrahigh conductivity in Weyl semimetal NbAs nanobelts. Nat. Mater. 18, 482–488 (2019).

4. Pshenay-Severin, D. A., Ivanov, Y. V., Burkov, A. A. & Burkov, A. T. Band structure and unconventional electronic topology of CoSi. J. Phys. Condens. Matter 30, 135–501 (2018).

5. Xu, X. et al. Crystal growth and quantum oscillations in the topological chiral semimetal CoSi. Phys. Rev. B 100, 045104 (2019).

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