Low‐temperature deposition of silicon dioxide films from electron cyclotron resonant microwave plasmas
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.342815
Reference35 articles.
1. Indirect plasma deposition of silicon dioxide
2. Remote plasma enhanced CVD deposition of silicon nitride and oxide for gate insulators in (In, Ga)As FET devices
3. Characteristics of the Surface-State Charge (Qss) of Thermally Oxidized Silicon
4. Dependence of Interface State Density on Silicon Thermal Oxidation Process Variables
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