Stable yttrium oxyfluoride used in plasma process chamber-Reference-Cited by-同舟云学术

Stable yttrium oxyfluoride used in plasma process chamber

Published:2017-01-31 Issue:2 Volume:35 Page:021405
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:J. Vac. Sci. Technol. A

Author:

Shiba Yoshinobu¹,Teramoto Akinobu²,Goto Tetsuya²,Kishi Yukio³,Shirai Yasuyuki²,Sugawa Shigetoshi⁴

Affiliation:

1. Graduate School of Engineering, Tohoku University, Aza-Aoba 6-6-11, Aramaki, Aoba-ku, Sendai 980-8579, Japan

2. New Industry Creation Hatchery Center, Tohoku University, Aza-Aoba 6-6-10, Aramaki, Aoba-ku, Sendai 980-8579, Japan

3. Nippon Yttrium Co., Ltd, Tosen, Omuta, Fukuoka 836-0003, Japan

4. Graduate School of Engineering, Tohoku University, Aza-Aoba 6-6-11, Aramaki, Aoba-ku, Sendai 980-8579, Japan and New Industry Creation Hatchery Center, Tohoku University, Aza-Aoba 6-6-10, Aramaki, Aoba-ku, Sendai 980-8579, Japan

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

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