Low temperature deposition: Properties of SiO2films from TEOS and ozone by APCVD system
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy
Link
http://stacks.iop.org/1742-6596/167/i=1/a=012020/pdf
Reference13 articles.
1. SiO2 Films from Tetraethoxysilane‐Based LPCVD: An Experimental Investigation of the By‐Product‐Inhibited Deposition Mechanism
2. TEOS and Ozone Atmospheric Pressure CVD of Borophosphosilicate Glass Films Using Triethylborate and Trimethylphosphate
3. An SiO2 Film Deposition Technology Using Tetraethylorthosilicate and Ozone for Interlayer Metal Dielectrics
4. A new model for low pressure chemical vapor deposition of SiO2 films by ozone augmented tetraethoxysilane
5. A Room Temperature Chemical Vapor Deposition SiOF Film Formation Technology for the Interlayer in Submicron Multilevel Interconnections
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