Novel oxidation process of hydrogenated amorphous silicon utilizing nitrous oxide plasma
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.107754
Reference7 articles.
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4. Influence of Laser Irradiation and Ambient Gas in Preparation of PZT Films by Laser Ablation
5. Investigation of surface passivation of amorphous silicon using photothermal deflection spectroscopy
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