Downstream microwave plasma‐enhanced chemical vapor deposition of oxide using tetraethoxysilane
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.346759
Reference12 articles.
1. The Deposition of Silicon Dioxide Films at Reduced Pressure
2. Low Pressure Deposition of Phosphosilicate Glass Films
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4. Mobile Charge in a Novel Spin‐On Oxide (SOX): Detection of Hydrogen in Dielectrics
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