1 000 000 °C/s thin film electrical heater:Insituresistivity measurements of Al and Ti/Si thin films during ultra rapid thermal annealing
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.111116
Reference8 articles.
1. Formation of ultrashallowp+layers in silicon by thermal diffusion of boron and by subsequent rapid thermal annealing
2. Ultrashallow, high doping of boron using molecular layer doping
3. In-situ doping of silicon using the gas immersion laser doping (GILD) process
4. Kinetic analysis of C49‐TiSi2and C54‐TiSi2formation at rapid thermal annealing rates
5. Formation of TiSi2 During Rapid Thermal Annealing: In Situ Resistance Measurements at Heating Rates From 1°C/S to 100°C/S.
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