An electromigration model that includes the effects of microstructure and temperature on mass transport

Author:

Dreyer M. L.,Fu K. Y.,Varker C. J.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Cited by 17 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Electromigration mechanisms in Cu nano-wires;2010 IEEE International Reliability Physics Symposium;2010

2. An analysis of the weakest-link model for early electromigration failure;Journal of Physics D: Applied Physics;2004-07-01

3. Electromigration model for the prediction of lifetime based on the failure unit statistics in aluminum metallization;Journal of Applied Physics;2003-01-15

4. Fabrication of nanocontacts for molecular devices using nanoimprint lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2002

5. Electromigration in YBa2Cu3O7−δ using a metal clad near-field scanning optical microscope probe;Applied Physics Letters;2000-10-02

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