New plasma‐assisted deposition technique using helicon activated reactive evaporation
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1145576
Reference19 articles.
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3. Comparison of stress in single and multiple layer depositions of plasma-deposited amorphous silicon dioxide;Journal of Physics D: Applied Physics;2005-12-15
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