Comparison of stress in single and multiple layer depositions of plasma-deposited amorphous silicon dioxide
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/0022-3727/39/i=1/a=024/pdf
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1. Soft magnetic properties and high frequency permeability in [CoAlO/oxide] multilayer films;Journal of Physics D: Applied Physics;2007-05-18
2. Low energy plasma treatment of a proton exchange membrane used for low temperature fuel cells;Plasma Physics and Controlled Fusion;2007-03-27
3. Magnetic anisotropy and high frequency permeability of multilayered nanocomposite FeAlO thin films;Journal of Applied Physics;2006-09
4. Interface creation and stress dynamics in plasma-deposited silicon dioxide films;Applied Physics Letters;2006-06-05
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