Mechanisms for the behavior of carbon films during annealing-Reference-Cited by-同舟云学术

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Mechanisms for the behavior of carbon films during annealing

Published:2004-08 Issue:8 Volume:70 Page:
ISSN:1098-0121
Container-title:Physical Review B
language:en
Short-container-title:Phys. Rev. B

Author:

McCulloch D.,Peng J.,McKenzie D.,Lau S.,Sheeja D.,Tay B.

Publisher

American Physical Society (APS)

Subject

Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.70.085406/fulltext

Reference24 articles.

1. Tetrahedral bonding in amorphous carbon

2. Plasma-based ion implantation utilising a cathodic arc plasma

3. On stress reduction of tetrahedral amorphous carbon films for moving mechanical assemblies

4. Low stress thick diamond-like carbon films prepared by filtered arc deposition for tribological applications

5. Stress relaxation and thermal evolution of film properties in amorphous carbon

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1. Controlling adhesion and thermal stability of tetrahedral amorphous carbon coatings with intermediate sp3C fraction;Thin Solid Films;2024-01

2. Microstructure evolution and mechanical performance of tetrahedral amorphous carbon coatings with dense droplets during annealing;Materials Chemistry and Physics;2023-06

3. Controlling Adhesion and Thermal Stability of Tetrahedral Amorphous Carbon Coatings with Intermediate Sp3c Fraction;2023

4. Electrophysical Properties and Structure of Natural Disordered sp2 Carbon;Nanomaterials;2022-10-27

5. Operando Formation of Van der Waals Heterostructures for Achieving Macroscale Superlubricity on Engineering Rough and Worn Surfaces;Advanced Functional Materials;2022-01-22

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