Interface creation and stress dynamics in plasma-deposited silicon dioxide films
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2210085
Reference21 articles.
1. Stress reduction in silicon dioxide layers by pulsing an oxygen/silane helicon diffusion plasma
2. Stress‐related problems in silicon technology
3. Stress-induced birefringence control in optical planar waveguides
4. Stress effects on the performance of optical waveguides
5. Silicon-dioxide waveguides with low birefringence
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1. Atmospheric Pressure Radio-Frequency DBD Deposition of Dense Silicon Dioxide Thin Film;Plasma Processes and Polymers;2016-07-14
2. Thermal annealing effects on the stress stability in silicon dioxide films grown by plasma-enhanced chemical vapor deposition;Microsystem Technologies;2016-06-02
3. Polarization Control in Silicon Photonic Waveguide Components Using Cladding Stress Engineering;Topics in Applied Physics;2010-09-30
4. A high sensitivity momentum flux measuring instrument for plasma thruster exhausts and diffusive plasmas;Review of Scientific Instruments;2009-05
5. Intermittent deposition and interface formation on the microstructure and magnetic properties of NiFe/Cu composite wires;Physica B: Condensed Matter;2008-09
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