Stress reduction in silicon dioxide layers by pulsing an oxygen/silane helicon diffusion plasma
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.368034
Reference17 articles.
1. Role of ions in electron cyclotron resonance plasma-enhanced chemical vapor deposition of silicon dioxide
2. Biased Electron Cyclotron Resonance Chemical-Vapor Deposition of Silicon Dioxide Inter-Metal Dielectric Thin Films
3. Deposition of silicon dioxide films using the helicon diffusion reactor for integrated optics applications
4. Dielectric thin film deposition by electron cyclotron resonance plasma chemical vapor deposition for optoelectronics
5. Effects of substrate temperature on the electrical and physical properties of silicon dioxide films deposited from electron cyclotron resonant microwave plasmas
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