Damage‐free selective etching of Si native oxides using NH3/NF3and SF6/H2O down‐flow etching
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.354890
Reference12 articles.
1. Investigations on hydrophilic and hydrophobic silicon (100) wafer surfaces by X-ray photoelectron and high-resolution electron energy loss-spectroscopy
2. Infrared spectroscopy of Si(111) surfaces after HF treatment: Hydrogen termination and surface morphology
3. On the Mechanisms of Lateral Solid Phase Epitaxial Growth of Amorphous Si Films Evaporated on SiO2Patterns
4. Low Temperature Surface Cleaning of Silicon and Its Application to Silicon MBE
5. Etching of SiO2Films by Si in Ultra-High Vacuum
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