Investigations on hydrophilic and hydrophobic silicon (100) wafer surfaces by X-ray photoelectron and high-resolution electron energy loss-spectroscopy-Reference-Cited by-同舟云学术

Investigations on hydrophilic and hydrophobic silicon (100) wafer surfaces by X-ray photoelectron and high-resolution electron energy loss-spectroscopy

Published:1986-02 Issue:2 Volume:39 Page:73-82
ISSN:0721-7250
Container-title:Applied Physics A Solids and Surfaces
language:en
Short-container-title:Appl. Phys. A

Author:

Grundner M.,Jacob H.

Publisher

Springer Science and Business Media LLC

Subject

General Materials Science,General Chemistry,Physics and Astronomy (miscellaneous),General Engineering,General Materials Science

Link

http://link.springer.com/content/pdf/10.1007/BF00616822.pdf

Reference35 articles.

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3. D.E. Aspnes, A.A. Studna: Appl. Phys. Lett.39, 316

4. F.J. Grunthaner, J. Maserjian: IEEE Trans. NS-24, 2108 (1977)

5. F.M. Schwettmann: Electrochem. Soc. Extended Abstr.78?1, 688 (1978)

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