Contribution of ions to the growth of amorphous, polymorphous, and microcrystalline silicon thin films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1289523
Reference47 articles.
1. Production of high‐quality amorphous silicon films by evaporative silane surface decomposition
2. Anionic clusters in dusty hydrocarbon and silane plasmas
3. Silane dissociation products in deposition discharges
4. Hydrogen chemical potential and structure ofa-Si:H
5. Growth mechanism of microcrystalline silicon obtained from reactive plasmas
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