Optimized hydrogen concentration within a remotely induced hollow-anode plasma for fast chemical-vapor-deposition of photosensitive and <110>-preferential microcrystalline silicon thin-films

Author:

Tabuchi Toshihiro,Toyoshima Yasumasa,Fujimoto Shinichi,Takashiri MasayukiORCID

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference42 articles.

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