Growth mechanism of microcrystalline silicon obtained from reactive plasmas
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference7 articles.
1. Formation kinetics and control of microcrystallite in μc-Si:H from glow discharge plasma
2. Control of silicon network structure in plasma deposition
3. Roles of Atomic Hydrogen in Chemical Annealing
4. A thermodynamic criterion of the crystalline-to-amorphous transition in silicon
5. Role of Surface and Growth-Zone Reactions in the Formation Process of µc-Si:H
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