Sputtering yields of Ru, Mo, and Si under low energy Ar+ bombardment
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3149777
Reference20 articles.
1. First performance results of the ASML alpha demo tool
2. Lifetime measurements on collector optics from Xe and Sn extreme ultraviolet sources
3. Kinetic simulation of an extreme ultraviolet radiation driven plasma near a multilayer mirror
4. Particle-in-cell Monte Carlo simulations of an extreme ultraviolet radiation driven plasma
5. A particle-in-cell plus Monte Carlo study of plasma-induced damage of normal incidence collector optics used in extreme ultraviolet lithography
Cited by 26 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. A density functional tight-binding based strategy for modeling ion bombardment and its application to Ar bombardment of silicon nitride;Journal of Applied Physics;2024-03-04
2. Plasma sputtering of biased electrodes in an oblique magnetic field;Plasma Sources Science and Technology;2023-09-01
3. Evaluation of Ta-Co alloys as novel high-k extreme ultraviolet mask absorber;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-06-21
4. Brief Review of Atomic Layer Etching Based on Radiofrequency-Biased Ar/C4F6-Mixture-Based Inductively Coupled Plasma Characteristics;Applied Science and Convergence Technology;2023-03-30
5. 基于蒙特卡罗方法的离子束溅射熔融石英、硅、金和铜行为特征规律仿真研究;Laser & Optoelectronics Progress;2023
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3