Thermal stability of tungsten ohmic contacts to the graded‐gap InGaAs/GaAs/AlGaAs heterostructure
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.101305
Reference10 articles.
1. Extremely Low Resistance Non-Alloyed Ohmic Contacts to n-GaAs Using Compositionally Graded InxGa1-xAs Layers
2. An (Al,Ga)As/GaAs heterostructure bipolar transistor with nonalloyed graded-gap ohmic contacts to the base and emitter
3. Self-aligned AlGaAs/GaAs HBT with low emitter resistance utilizing InGaAs cap layer
4. Ohmic contacts to n‐GaAs using graded band gap layers of Ga1−xInxAs grown by molecular beam epitaxy
5. Symmetric-gain, zero-offset, self-aligned, and refractory-contact double HBT's
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1. Three-Dimensional Integration of InAs Nanowires by Template-Assisted Selective Epitaxy on Tungsten;Nano Letters;2023-05-25
2. High-PerformanceIn0.5Al0.5As/In0.5Ga0.5AsHigh Electron Mobility Transistors on GaAs;Japanese Journal of Applied Physics;1996-11-15
3. New low contact resistance triple capping layer enabling very high Gm InAIAs/lnGaAs HEMTs;Journal of Electronic Materials;1996-05
4. Influence of metal/n‐InAs/interlayer/n‐GaAs structure on nonalloyed ohmic contact resistance;Journal of Applied Physics;1994-11
5. FABRICATION TECHNIQUES FOR SELF-ALIGNED GaAs-BASED HBTs AND SUBMICRON GATE LENGTH FETs;International Journal of Modern Physics B;1994-07-20
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