Furnace formation of silicon oxynitride thin dielectrics in nitrous oxide (N2O): The role of nitric oxide (NO)
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.356374
Reference14 articles.
1. Highly reliable thin nitrided SiO2 films formed by rapid thermal processing in an N2O ambient
2. High Quality Ultrathin Gate Dielectrics Formation by Thermal Oxidation of Si in N 2 O
3. Effects of N/sub 2/O anneal and reoxidation on thermal oxide characteristics
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